New ALD/MLD Processes Enable Cobalt‑Organic Thin Films and Tunable Porous CoO for Advanced Manufacturing

The Advanced Materials Technologies article by Jussila et al. (Jan 2026) introduces three atomic‑/molecular‑layer‑deposition (ALD/MLD) processes that employ an all‑nitrogen‑coordinated cobalt precursor, Co(tmsaedma)₂, together with three benzene‑based organic linkers: hydroquinone (HQ), benzenedithiol (BDT) and terephthalic acid (BDC). Experiments and DFT calculations reveal a reactivity hierarchy

Sector: Real Infrastructure | Confidence: 91%
Source: https://semiengineering.com/three-new-ald-mld-processes-for-co-organic-thin-films-aalto-university-rub-et-al/

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